Paper mill waste gas treatment equipment treatment equipment

Paper mill waste gas treatment equipment treatment equipment

Reconditioning equipment

Plasma is a gas that is ionized. Its English name is plasma, which was named by muir in 1927 for scientific research on the charge and discharge of mercury vapor at low pressure. Plasma technology is composed of many particles, neutralized molecules, excited molecules, photonic beauty and oxygen free radicals, but the positive charge of electronic devices and positive ions must show the surface of the neutral, that is to say, "plasma technology" meaning. Plasma technology is different from solid, liquid and vapor in that it conducts electricity and is exposed to electromagnetic induction at many levels, which is why many people refer to it as the fourth class of chemical conditions. Depending on the situation, temperature and the relative density of positive ions, plasma technology can generally be divided into high temperature plasma technology and low temperature plasma (xiaolongbao and cold plasma technology). Among them, the ionization degree of high temperature plasma technology is close to 1, and the temperature of various objects is basically in thermal equilibrium, which is applied to control the scientific research of planned thermonuclear reaction. Low temperature plasmas, on the other hand, are disequilibrium, with different temperatures for different objects. Among them, the temperature of electronic devices (Te)≥ positive ion temperature (Ti) reaches about 104K, and the temperature of positive ions and neutral objects can be as low as 300 ~ 500K. Generally, vapor emitting electronic devices are attributed to low temperature plasma.

As of 2013, scientific research into the efficacy of low-temperature plasmas was attributed to inelastic collisions. Ultra-low temperature isoionization contains electronic devices, positive ions, oxygen radicals and excited state molecular structure, in which shock electronic devices and vapor molecular structure (molecules) collision, energy into the ground state molecular structure (molecules) of mechanical energy, resulting in a series of excited, dissociation and ionization at the active state. It not only opens the molecular structure bond of the vapor body, but also transforms it into some monomolecular structures and solid particles. Another force. OH, H2O2. Isooxygen free radical and very strong reducibility of O3, here in the whole process of shock electronic devices play a fundamental effect, the positive ion thermal fitness movement can only have a negative effect. Under superheated steam, the charge and discharge of the vapor results in the unbalanced aspect ratio (ohw) of the electronic device in the plasma technology far exceeds the vapor temperature (the indoor temperature is around 100℃). In the non-equilibrium plasma technology, there will be many types of exothermic reactions, the key decision on the mean kinetic energy of electronic devices, electron density, vapor temperature, molecular structure density of harmful substances and ≥ vapor component. This shows that some reactions that must have large activation energies, such as the removal of insoluble air pollutants from the air, can also be addressed for lower concentrations, higher water flow, and higher amounts of volatile organic chemical air pollutants and sulfur content air pollutants.

Common ways of the plasma technology is gas charging and discharging, to put it bluntly gas charging and discharging is an electronic device according to some sort of system in ionization of the gas molecules or molecular structure went out, the gas medium is called ionization gas, if from the electrostatic field ionization gas cause and produce the conduction current, this situation is called gas charging and discharging. According to the principle caused by charge and discharge, the pressure j source characteristics of the vapor and the geometric appearance of the electrical level, the charge and discharge plasma technology of the vapor are divided into the following types: glow discharge; (3) material block charge and discharge; (4) frequency charge and discharge; Microwave heating charge and discharge. Any plasma technology created in this way must be charged and discharged at high pressure. It's very easy to ignite and create a risk. Because regulation of airborne pollutants, such as vapors, is usually regulated under superheated steam.

5. Catalytic oxidation and microbial lampblack purifier

Catalytic oxidation is a deep reflection technique at room temperature. Photocatalytic reaction can be in indoor temperature, gas, and water layers in the organic chemistry of air pollutant air oxidation into non-toxic no harm matter thoroughly, while traditional high temperature incineration technology under high temperature to air pollutants can be devastated, namely the application of the basic way of catalytic reaction, air oxidation temperatures should also have a few baidu.

In basic theory, a semiconductor material will always act as a photocatalyst if the absorption of concentrated light is no less than its band gap energy, which can be excited to cause electronic devices and cavitation. Hydroxides or sulfides, such as Ti0, are commonly found in the photocatalysts of mono-chemical substances. , Zn0, ZnS, CdS and PbS, etc. This metal catalyst has prominent advantages for special reactions, which can be used in actual scientific research. For example, the band gap energy of CdS semiconductor material is small, which has good matching characteristics with the near ultraviolet segment of the solar spectrum, and can make good use of sunlight energy. Relatively speaking, Ti02 has a good comprehensive energy and is the most widely used and scientifically studied single chemical photocatalyst.